Carmela C. Amato-Wierda

Associate Professor
Phone: (603) 862-2526
Office: Materials Science, Parsons Hall Rm N139, Durham, NH 03824
Carmela Amato-Wierda


  • Ph.D., Chemistry, Rensselaer Polytechnic Institute
  • B.A., Chemistry, Harvard University
  • B.A., Physics, Harvard University

Courses Taught

  • MS 401: Science of Stuff
  • MS 402: Nanoscience in Energy
  • TECH 820: Tech & PBL for Teachers

Selected Publications

Leichtman, M. D., Camilleri, K. A., Pillemer, D. B., Amato-Wierda, C. C., Hogan, J. E., & Dongo, M. D. (2017). Talking after school: Parents’ conversational styles and children’s memory for a science lesson. Journal of Experimental Child Psychology, 156, 1-15. doi:10.1016/j.jecp.2016.11.002

Norton, E. T., & Amato-Wierda, C. C. (2001). Kinetics and mechanism relevant to TiSiN chemical vapor deposition from TDMAT, silane and ammonia. Surface and Coatings Technology, 148(2-3), 251-255. doi:10.1016/S0257-8972(01)01344-5

Ji, H. X., & Amato-Wierda, C. C. (2001). Chemical vapor deposition of TiWC thin films. Surface and Coatings Technology, 148(2-3), 262-267. doi:10.1016/S0257-8972(01)01342-1

Wierda, D. A., Reddy, C. M., & Amato-Wierda, C. C. (2001). Gas phase analysis of TiCl4 plasma processes by molecular beam mass spectrometry. Surface and Coatings Technology, 148(2-3), 256-261. doi:10.1016/S0257-8972(01)01343-3

Amato-Wierda, C. C., Norton, E. T., & Wierda, D. A. (1999). Silane Activation by Ti(NMe 2 ) 4 and NH 3 during Chemical Vapor Deposition of Ti−Si−N Films. Chemistry of Materials, 11(10), 2775-2779. doi:10.1021/cm990174j

Most Cited Publications