
Carmela Amato-Wierda
Dr. Amato-Wierda has developed two new general education science courses for non-STEM students. The Science of Stuff is an introductory course in materials science that demonstrates how atomic structure influences the properties and function of matter.Nanoscience and Energy explores nanoscience and its role in providing energy for society in the future.
Additionally, Dr. Amato-Wierda has served as PI for these previously NSF funded curriculum improvement efforts: (1) General Chemistry Investigations: An Interdisciplinary, Research Team Laboratory, and (2) Implementation of a Materials Synthesis and Characterization Laboratory Component Across the Undergraduate Science and Engineering Curriculum. Dr. Amato-Wierda also played an active role in developing the new graduate program in Materials Science at the University of New Hampshire.
Dr. Amato-Wierda is the faculty advisor for the UNH Chapter of the National Society of Black Engineers. She served on the New Hampshire Board of Licensure for Professional Engineers from 2001-2011, and currently serves on the Air Resources Council for the New Hampshire Department of Environmental Services.
Courses Taught
- CHEM 405: Chem Principles for Engineers
- CHEM 409: Chemistry and Society
- MS 401: Honors/Science of Stuff
- MS 402: Nanoscience in Energy
- MS 960: Thermo Kinetics I
Education
- Ph.D., Chemistry, Rensselaer Polytechnic Institute
- B.A., Physics, Harvard University
- B.A., Chemistry, Harvard University
Selected Publications
Leichtman, M. D., Camilleri, K. A., Pillemer, D. B., Amato-Wierda, C. C., Hogan, J. E., & Dongo, M. D. (2017). Talking after school: Parents' conversational styles and children's memory for a science lesson. JOURNAL OF EXPERIMENTAL CHILD PSYCHOLOGY, 156, 1-15. doi:10.1016/j.jecp.2016.11.002
Ji, H. X., & Amato-Wierda, C. C. (2001). Chemical vapor deposition of Ti-W-C thin films. SURFACE & COATINGS TECHNOLOGY, 148(2-3), 262-267. doi:10.1016/S0257-8972(01)01342-1
Wierda, D. A., Reddy, C. M., & Amato-Wierda, C. C. (2001). Gas phase analysis of TiCl4 plasma processes by molecular beam mass spectrometry. SURFACE & COATINGS TECHNOLOGY, 148(2-3), 256-261. doi:10.1016/S0257-8972(01)01343-3
Norton, E. T., & Amato-Wierda, C. C. (2001). Kinetics and mechanism relevant to TiSiN chemical vapor deposition from TDMAT, silane and ammonia. SURFACE & COATINGS TECHNOLOGY, 148(2-3), 251-255. doi:10.1016/S0257-8972(01)01344-5
Norton, E. T., & Amato-Wierda, C. C. (2001). Kinetics and mechanism of the thermal decomposition of tetrakis(dimethylamino)titanium. In FUNDAMENTAL GAS-PHASE AND SURFACE CHEMISTRY OF VAPOR-PHASE DEPOSITION II AND PROCESS CONTROL, DIAGNOSTICS, AND MODELING IN SEMICONDUCTOR MANFACTURING IV Vol. 2001 (pp. 9-16). Retrieved from https://www.webofscience.com/
Reddy, C. M., & Amato-Wierda, C. C. (2001). Gas phase analysis of TiCl4 and NH3 plasma processes by molecular beam mass spectrometry. In FUNDAMENTAL GAS-PHASE AND SURFACE CHEMISTRY OF VAPOR-PHASE DEPOSITION II AND PROCESS CONTROL, DIAGNOSTICS, AND MODELING IN SEMICONDUCTOR MANFACTURING IV Vol. 2001 (pp. 397-404). Retrieved from https://www.webofscience.com/
Amato-Wierda, C. C., Wierda, D. A., & Norton, E. T. (2000). Low-temperature chemical vapor deposition of titanium nitride thin films.. In ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY Vol. 219 (pp. U831). Retrieved from https://www.webofscience.com/
Amato-Wierda, C. C., Abrams, E., Bauer, C., Bourgeois, D., Mueller, A., & Pierson, A. (2000). CHEMPROJECTS: Laboratory-driven general chemistry course.. In ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY Vol. 219 (pp. U432). Retrieved from https://www.webofscience.com/
Amato-Wierda, C. C., Norton, E. T., & Wierda, D. A. (2000). Molecular beam mass spectrometry studies of the thermal decomposition of tetrakis(dimethylamino)titanium. In CHEMICAL PROCESSING OF DIELECTRICS, INSULATORS AND ELECTRONIC CERAMICS Vol. 606 (pp. 103-107). Retrieved from https://www.webofscience.com/
Amato-Wierda, C. C., Norton, E. T., & Wierda, D. A. (1999). Silane activation by Ti(NMe2)(4) and NH3 during chemical vapor deposition of Ti-Si-N films. CHEMISTRY OF MATERIALS, 11(10), 2775-2779. doi:10.1021/cm990174j